Can Combination of Low-Level Laser and Light-Emitting Diodes Enhance Stability of Dental Implants?
Use Low-Level Laser and Light-Emitting Diodes in Dental Implants
Study Overview
Status
Status
Conditions
Conditions
Intervention / Treatment
Intervention / Treatment
Detailed Description
Subjects eligible for study inclusion had an edentulous area at the first molar of the mandible and needed a dental implant. Subjects were excluded from study enrollment if they had any diseases that affect bone, smoking, insufficient bone in the edentulous area which needs bone augmentation, failed to return for follow-up, or refused study enrollment.
All implants were placed at least 3 months after tooth removal. The size of implants was 4.8X 10 mm (Zimmer, USA) Subjects were aligned based on computer randomization in two groups: In group 1(intervention), subjects received LLL and LED after implant placement and in group 2 (control) the same device was used while device was off.
A portable device was applied for irradiation of the intervention group with combination of 810nm laser and 632nm LED.
Subjects in group 1 underwent LLL 15 mw/cm2 and LED 10 mw/cm2 20 min every day for 10 days.
The mesiodistal and buccolingual directions were measured and the mean implant stability quotients (ISQs) were determined. The RFA measurements were performed in immediate after insertion (time0) 10 days (time1), 3 weeks (time2), 6 weeks(time3) and 9(time 4) weeks after implant placement.
Study Type
Study Type
Enrollment (Actual)
Enrollment
Phase
Phase
- Not Applicable
Participation Criteria
Eligibility Criteria
Eligibility Criteria
Ages Eligible for Study
Accepts Healthy Volunteers
Genders Eligible for Study
Description
Inclusion Criteria:
- subjects eligible for study inclusion had an edentulous area at the first molar of the mandible and needed a dental implant
Exclusion Criteria:
- . Subjects were excluded from study enrollment if they had any diseases that affect bone, smoking, insufficient bone in the edentulous area which needs bone augmentation, failed to return for follow-up, or refused study enrollment.
Study Plan
How is the study designed?
Design Details
- Primary Purpose: OTHER
- Allocation: RANDOMIZED
- Interventional Model: PARALLEL
- Masking: NONE
Number of Arms
Arms and Interventions
Participant Group / ArmParticipant Group / Arm |
Intervention / TreatmentIntervention / Treatment |
|---|---|
|
ACTIVE_COMPARATOR: Laser Emitting group
subjects received Low-Level Laser and Light-Emitting Diodes after implant placement
|
Combination of Low-Level Laser and Light-Emitting Diodes were used after dental implant placement for enhancement of stability
A dental implant with 4.8X 10 mm (Zimmer, USA) size was placed at the posterior of the mandible
|
|
PLACEBO_COMPARATOR: Non Emitting group
In laser emitiiing group, subjects received Low-Level Laser and Light-Emitting Diodes after implant placement and in Non-emitting group,the same device was used while device was off.
|
Combination of Low-Level Laser and Light-Emitting Diodes were used after dental implant placement for enhancement of stability
A dental implant with 4.8X 10 mm (Zimmer, USA) size was placed at the posterior of the mandible
|
What is the study measuring?
Primary Outcome Measures
Primary Outcome Measures
Outcome Measure |
Measure Description |
Time Frame |
|---|---|---|
|
Resonance frequency analysis
Time Frame: Immidate after implant placement (time 0)
|
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
|
Immidate after implant placement (time 0)
|
|
Resonance frequency analysis
Time Frame: 10 days (time1) after implant placement
|
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
|
10 days (time1) after implant placement
|
|
Resonance frequency analysis
Time Frame: Three weeks after implant placement (time 2)
|
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
|
Three weeks after implant placement (time 2)
|
|
Resonance frequency analysis
Time Frame: Six weeks after implant placement (time 3)
|
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
|
Six weeks after implant placement (time 3)
|
|
Resonance frequency analysis
Time Frame: Nine weeks after implant placement(time 4)
|
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
|
Nine weeks after implant placement(time 4)
|
Collaborators and Investigators
Sponsor
Sponsor
Collaborators
Collaborators
Study record dates
Study Major Dates
Study Start (ACTUAL)
Study Start
Primary Completion (ACTUAL)
Primary Completion
Study Completion (ACTUAL)
Study Completion
Study Registration Dates
First Submitted
First Submitted
First Submitted That Met QC Criteria
First Submitted That Met QC Criteria
First Posted (ACTUAL)
First Posted
Study Record Updates
Last Update Posted (ACTUAL)
Last Update Posted
Last Update Submitted That Met QC Criteria
Last Update Submitted That Met QC Criteria
Last Verified
Last Verified
More Information
Terms related to this study
Other Study ID Numbers
Other Study ID Numbers
- Fr1396
Plan for Individual participant data (IPD)
Plan to Share Individual Participant Data (IPD)?
Drug and device information, study documents
Studies a U.S. FDA-regulated drug product
Studies a U.S. FDA-regulated device product
This information was retrieved directly from the website clinicaltrials.gov without any changes. If you have any requests to change, remove or update your study details, please contact register@clinicaltrials.gov. As soon as a change is implemented on clinicaltrials.gov, this will be updated automatically on our website as well.
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